hybrid-bonding displaces euv
displacement a named mechanism, not a conclusion
The binding constraint migrates from lithography to bonding overlay
The path
| node | effect |
|---|---|
| Hybrid Bonding | — |
| Extreme Ultraviolet Lithography (EUV / High-NA EUV) | +0.11 |
Arguments about this mechanism
These name its subject — they are claims about this mechanism, and they are what the eligibility gates grade.